Ion implantation is an important process which is widely used in semiconductor device fabrication, metal finishing, and materials science research. The components of ion implantation are often made of TZM alloy, molybdenum, tungsten because these materials could perform well in a harsh environment.
Ion implantation is an important process which is widely used in semiconductor device fabrication, metal finishing, and materials science research. The components of ion implantation are often made of TZM alloy, molybdenum, tungsten because these materials could perform well in a harsh environment.
Advanced Refractory Metals provides ion implantation components made of various materials with competitive price.
Customized
* Used to manufacture semiconductors.
* Used in metal finishing for tool steel toughening and surface finishing.
* Used in ion beam mixing to achieve graded interface and strengthen adhesion between immiscible material.
Our Ion Implantation Components (TZM Alloy) is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.