Tantalum Sputtering Targets are made from tantalum plate. Tantalum has the ability to form thin oxides, and the resulting oxide film has a protective effect, so tantalum is widely used as a base material for electrolyte capacitor manufacturing.
Advanced Refractory Metals (ARM) is a global supplier of Tantalum Sputtering Targets and we can provide customized tantalum products. ARM's Tantalum Sputtering Targets is manufactured through cold-working process, through forging, rolling, swaging, and drawing to get the desired size.
Part No. | Material | Size | Purity |
TA0201 | Tantalum | 1.00" Dia. x 0.125" Thick | 99.95% |
TA0202 | Tantalum | 1.00" Dia. x 0.250" Thick | 99.95% |
TA0203 | Tantalum | 2.00" Dia. x 0.125" Thick | 99.95% |
TA0204 | Tantalum | 2.00" Dia. x 0.250" Thick | 99.95% |
TA0205 | Tantalum | 3.00" Dia. x 0.250" Thick | 99.95% |
TA0206 | Tantalum | 3.00" Dia. x 0.250" Thick | 99.95% |
TA0207 | Tantalum | 4.00" Dia. x 0.250" Thick | 99.95% |
TA0208 | Tantalum | 4.00" Dia. x 0.250" Thick | 99.95% |
TA0209 | Tantalum | 5.00" Dia. x 0.250" Thick | 99.95% |
TA0210 | Tantalum | 5.00" Dia. x 0.250" Thick | 99.95% |
Tantalum Sputtering Target can be:
* Used in a thermal inkjet printhead, can form the anti-cavitation film.
* Used in the integrated circuit with the base coating process to form a tantalum film which can prevent the diffusion of copper into the substrate silicon.
* Used in liquid crystal display (LCD), as well as heat, corrosion resistance, high conductivity, and other coating industries.
Our Tantalum Sputtering Targets are carefully packed to prevent damage during storage & transportation.